On March 8, the R&D and production base project for flat panel display blank masks by S&S TECH was officially signed and settled in Suzhou.

S&S TECH plans to invest 150 million US dollars (approximately 1.038 billion RMB) to build an R&D and production base for flat panel display blank masks in Suzhou Industrial Park. Upon full operation, the project is expected to achieve total sales of 900 million US dollars (around 6.228 billion RMB) over the next five years.

Blank masks are the core raw material for photomasks, widely used in semiconductors and display panels including TFT‑LCD and OLED. As a leading enterprise in South Korea’s semiconductor blank mask sector, S&S TECH specializes in the manufacturing and sales of blank masks for semiconductors, flat panel displays (such as TFT‑LCD), color filters and other related applications.

Notably, China has also made new progress in photomasks—the downstream sector of blank masks—this year. The high‑generation high‑precision photomask production base project of Luwei Optoelectronics in Xiamen has achieved phased construction results. Its three main factory buildings were fully capped in January this year and have now entered interior decoration and electromechanical installation.

With a total planned investment of 2 billion RMB, the project will build 11 high‑end photomask production lines, focusing on R&D and production of high‑precision photomasks for G8.6 and below generations used in AMOLED, LTPO, LTPS and FMM applications. The project broke ground in July 2025.

It will be constructed and put into production in phases, with five production lines to be built first in the preliminary stage. Based on current construction progress, core equipment is expected to be installed in the first half of this year, and trial production is targeted for the middle of 2026.